1. Leading the Edge: Wafer-scale Epitaxy of Single-crystal, non-Silicon Monolayer Semiconducting Materials with Ultrahigh Mobility
The holy grail of next-generation electronics is to identify viable alternatives for non-Silicon electronics with synthetic scalability, industry-compatible processability, crystallinity, and, most importantly, ultra-high mobility. Chemical vapor deposition (CVD) provides an enabling platform to stitch dissimilar atoms into functional molecules where the periodic and repeated arrangement of lattices is perfect and extends throughout the entirety of the specimen without interruption. The result is the wafer-scale uniformity and unparalleled electronic properties on par with the mechanically exfoliated benchmarks. Current projects straddle across (a) lattice orientations; (b) heterogeneous junctions; (c) dopants; (d) metal contacts; and (e) device integration, respectively. Notable applications include but are not limited to the Internet of Things (IoT), flexible electronics, and next-generation semiconductors.
Collaboration:
Prof. Jeehwan Kim and Prof. Jing Kong at MIT;
Prof. Lance Li at HKU;
Prof. Deep Jariwalla at UPenn;
Prof. Sang-Hoon Bae at the University of Washington, St. Loius;
Prof. Wen-Hao Chang at NCTU, Taiwan;
TSMC